CVD system for Graphene Deposition
It is a low pressure CVD system fabricated in our research lab especially for synthesis of graphene films.
Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Atomic Layer Deposition System
This ALD System is fabricated in our research lab
ALD is a CVD-derived thin film deposition technique that appears to be the most promising technique for the deposition of ultrathin films of high-k materials for future microelectronics applications. ALD is based on the application of sequential, self-limiting surface reactions. ALD may be considered as a type of CVD where the gas phase precursors are introduced alternately instead of simultaneously
Gas Sensor Set up
This photograph deals with the gas sensing measurement facility that have fabricated .
We have employed the static method where gas concentration was determined by volume ratio. With the help of the temperature controller the sensor is brought to the desired temperature. Once the temperature is reached the desired concentration of gas is taken from calibrated cylinder and injected into the test chamber. The variation of sensor resistance in the presence of test gas is monitored using keithley 195A digital multimeter .All the measurements are carried out at atmospheric pressure.